Low-dimensional nanomaterials, such as one-dimensional (1D) carbon nanotubes (CNTs) and two-dimensional (2D) transition metal dichalcogenides (TMDCs), have attracted significant attention for next-generation electronic and optoelectronic devices. For practical applications, these materials must be produced at wafer-scale areas in the form of continuous films. Chemical vapor deposition (CVD) is the most commonly used method for large-area synthesis of low-dimensional materials; however, the high process temperatures and challenges in optimizing reaction conditions limit its widespread applicability. As an alternative strategy, solution-based processing has been actively explored due to its simplicity and cost-effectiveness. Despite the advantages in processing, solution-processed low-dimensional material films have long been considered unsuitable for device applications due to their electronic properties, which are significantly inferior to those produced by CVD. Specifically, the limited gate tunability of these nanomaterial thin-film assembly and large junction resistances arising from poor stacking morphology have hindered the production of high-quality films suitable for electronic and optoelectronic devices. In this seminar, I will present my research progress on advancing solution-processed materials and demonstrate how these advancements have enabled the development of scalable electronic and optoelectronic devices, such as field-effect transistors, photodetectors, and memory devices.